검색결과 : 16건
| No. | Article |
|---|---|
| 1 |
Reconstruction of cross-sectional temperature distributions of water around a thin heating wire by inverse Abel transform of near-infrared absorption images Kakuta N, Kondo K, Arimoto H, Yamada Y International Journal of Heat and Mass Transfer, 77, 852, 2014 |
| 2 |
Temperature imaging of sub-millimeter-thick water using a near-infrared camera Kakuta N, Kondo K, Ozaki A, Arimoto H, Yamada Y International Journal of Heat and Mass Transfer, 52(19-20), 4221, 2009 |
| 3 |
Ring-closing metathesis approach to a 16-membered macrocycle of kendomycin Sengoku T, Uemura D, Arimoto H Chemistry Letters, 36(6), 726, 2007 |
| 4 |
Predicting electron projection lithography mask membrane image placement errors Boruszewski MJ, Engelstad RL, Sakaue H, Arimoto H, Eguchi H Journal of Vacuum Science & Technology B, 24(6), 2866, 2006 |
| 5 |
Direct measurements and analyses of the Coulomb effects in electron projection lithography Yamamoto J, Yamashita H, Arimoto H, Ikeda J, Suzuki S, Kawata S Journal of Vacuum Science & Technology B, 23(6), 3182, 2005 |
| 6 |
Proximity effect correction using blur map in electron projection lithography Yamashita H, Yamamoto J, Koba F, Arimoto H Journal of Vacuum Science & Technology B, 23(6), 3188, 2005 |
| 7 |
Two-dimensional characterization of carrier concentration in metal-oxide-semiconductor field-effect transistors with the use of scanning tunneling microscopy Fukutome H, Arimoto H, Hasegawa S, Nakashima H Journal of Vacuum Science & Technology B, 22(1), 358, 2004 |
| 8 |
3D proximity effect correction based on the simplified electron energy flux model in electron-beam lithography Osawa M, Ogino K, Hoshino H, Machida Y, Arimoto H Journal of Vacuum Science & Technology B, 22(6), 2923, 2004 |
| 9 |
Lithographic performance of diamond-like carbon membrane mask in electron projection lithography Yamashita H, Amemiya I, Yamabe M, Arimoto H Journal of Vacuum Science & Technology B, 22(6), 3067, 2004 |
| 10 |
High-performance proximity effect correction for sub-70 nm design rule system on chip devices in 100 kV electron projection lithography Ogino K, Hoshino H, Machida Y, Osawa M, Arimoto H, Takahashi K, Yamashita H Journal of Vacuum Science & Technology B, 21(6), 2663, 2003 |