화학공학소재연구정보센터
검색결과 : 16건
No. Article
1 Optimisation and scaling of interfacial GeO2 layers for high-kappa gate stacks on germanium and extraction of dielectric constant of GeO2
Murad SNA, Baine PT, McNeill DW, Mitchell SJN, Armstrong BM, Modreanu M, Hughes G, Chellappan RK
Solid-State Electronics, 78, 136, 2012
2 Internal photoemission study on charge trapping behavior in rapid thermal oxides on strained-Si/SiGe heterolayers
Bera MK, Mahata C, Bhattacharya S, Chakraborty AK, Armstrong BM, Gamble HS, Maiti CK
Applied Surface Science, 255(5), 2971, 2008
3 Germanium on sapphire by wafer bonding
Baine PT, Gamble HS, Armstrong BM, McNeill DW, Mitchell SJN, Low YH, Rainey PV
Solid-State Electronics, 52(12), 1840, 2008
4 Fabrication and characterisation of high resistivity SOI substrates for monolithic high energy physics detectors
Ruddell FH, Suder SL, Bain MF, Montgomery JH, Armstrong BM, Gamble HS, Denvir D, Casse G, Bowcock T, Allport PP, Marczewski J, Kucharski K, Tomaszewski D, Niemiec H, Kucewicz W
Solid-State Electronics, 52(12), 1849, 2008
5 Cross-talk suppression in SOI substrates
Baine P, Jin M, Gamble HS, Armstrong BM, Linton D, Mohammed F
Solid-State Electronics, 49(9), 1461, 2005
6 Determination of band offsets in strained-Si heterolayers
Maiti C, Samanta SK, Chatterjee S, Dalapati GK, Bhattacharya S, Armstrong BM, Gamble HS, McCarthy J, Perova TS, Moore RA
Thin Solid Films, 462-63, 80, 2004
7 Silicon-on-insulator substrates with buried tungsten silicide layer
Gamble HS, Armstrong BM, Baine P, Bain M, McNeill DW
Solid-State Electronics, 45(4), 551, 2001
8 Polycrystalline silicon film growth in a SiF4/SiH4/H-2 plasma
Lee B, Quinn LJ, Baine PT, Mitchell SJN, Armstrong BM, Gamble HS
Thin Solid Films, 337(1-2), 55, 1999
9 Mode of attack of atomic carbon on benzene rings
Armstrong BM, Zheng FM, Shevlin PB
Journal of the American Chemical Society, 120(24), 6007, 1998
10 The realization of silicon-on-insulator utilizing trench-before-bond and polish stop technology
Baine PT, Gay DL, Armstrong BM, Gamble HS
Journal of the Electrochemical Society, 145(5), 1738, 1998