검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Influence of the process parameters on the properties of hydrogenated amorphous carbon thin films deposited using ECR plasma Piazza F, Arnal Y, Grambole D, Herrmann F, Kildemo M, Lacoste A, Relihan G, Golanski A Thin Solid Films, 383(1-2), 196, 2001 |
| 2 |
Parametric study of the etching of SiO2 in SF6 plasmas: Modeling of the etching kinetics and validation Lagarde T, Pelletier J, Arnal Y Journal of Vacuum Science & Technology B, 17(1), 118, 1999 |
| 3 |
New line of high voltage high current pulse generators for plasma-based ion implantation Maulat O, Roche M, Le Coeur F, Lesaint O, Arnal Y, Pelletier J Journal of Vacuum Science & Technology B, 17(2), 879, 1999 |
| 4 |
Preparation of Low-Resistivity Tungsten Thin-Films Deposited by Microwave-Plasma-Enhanced Chemical-Vapor-Deposition from the Tungsten Hexafluoride Hydrogen System Belkacem A, Arnal Y, Pelletier J, Andre E, Oberlin JC Thin Solid Films, 241(1-2), 301, 1994 |