검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
In situ physical vapor deposition of ionized Ti and TiN thin films using hollow cathode magnetron plasma source D'Couto GC, Tkach G, Ashtiani KA, Hartsough L, Kim E, Mulpuri R, Lee DB, Levy K, Fissel M, Choi S, Choi SM, Lee HD, Kang HK Journal of Vacuum Science & Technology B, 19(1), 244, 2001 |
| 2 |
Ionized physical-vapor deposition using a hollow-cathode magnetron source for advanced metallization Klawuhn E, D'Couto GC, Ashtiani KA, Rymer P, Biberger MA, Levy KB Journal of Vacuum Science & Technology A, 18(4), 1546, 2000 |
| 3 |
Characterization of magnetron-sputtered partially ionized aluminum deposition Hayden DB, Juliano DR, Green KM, Ruzic DN, Weiss CA, Ashtiani KA, Licata TJ Journal of Vacuum Science & Technology A, 16(2), 624, 1998 |