화학공학소재연구정보센터
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No. Article
1 First lithographic results from the extreme ultraviolet Engineering Test Stand
Chapman HN, Ray-Chaudhuri AK, Tichenor DA, Replogle WC, Stulen RH, Kubiak GD, Rockett PD, Klebanoff LE, O'Connell D, Leung AH, Jefferson KL, Wronosky JB, Taylor JS, Hale LC, Blaedel K, Spiller EA, Sommargren GE, Folta JA, Sweeney DW, Gullikson EM, Naulleau P, Goldberg KA, Bokor J, Attwood DT, Mickan U, Hanzen R, Panning E, Yan PY, Gwyn CW, Lee SH
Journal of Vacuum Science & Technology B, 19(6), 2389, 2001
2 Progress Towards Lambda/20 Extreme-Ultraviolet Interferometry
Goldberg KA, Beguiristain R, Bokor J, Medecki H, Attwood DT, Jackson K, Tejnil E, Sommargren GE
Journal of Vacuum Science & Technology B, 13(6), 2923, 1995
3 Patterning a 50-nm Period Grating Using Soft-X-Ray Spatial-Frequency Multiplication
Wei M, Attwood DT, Gustafson TK, Anderson EH
Journal of Vacuum Science & Technology B, 12(6), 3648, 1994
4 Imaging of Extreme-Ultraviolet Lithographic Masks with Programmed Substrate Defects
Nguyen KB, Mizota T, Haga T, Kinoshita H, Attwood DT
Journal of Vacuum Science & Technology B, 12(6), 3833, 1994