| 1 |
Effect of flow velocity on fiber efficiency and particle residence time during filtration of aqueous dispersions-An experimental and simulation study
Rastegar V, Ahmadi G, Babu SV
Particulate Science and Technology, 37(2), 161, 2019 |
| 2 |
Filtration of aqueous colloidal ceria slurries using fibrous filters -An experimental and simulation study
Rastegar V, Ahmadi G, Babu SV
Separation and Purification Technology, 176, 231, 2017 |
| 3 |
Use of anionic surfactants for selective polishing of silicon dioxide over silicon nitride films using colloidal silica-based slurries
Penta NK, Amanapu HP, Peethala BC, Babu SV
Applied Surface Science, 283, 986, 2013 |
| 4 |
Use of Multifunctional Carboxylic Acids and Hydrogen Peroxide To Improve Surface Quality and Minimize Phosphine Evolution During Chemical Mechanical Polishing of Indium Phosphide Surfaces
Matovu JB, Ong P, Leunissen LHA, Krishnan S, Babu SV
Industrial & Engineering Chemistry Research, 52(31), 10664, 2013 |
| 5 |
Cobalt Polishing with Reduced Galvanic Corrosion at Copper/Cobalt Interface Using Hydrogen Peroxide as an Oxidizer in Colloidal Silica-Based Slurries
Peethala BC, Amanapu HP, Lagudu URK, Babu SV
Journal of the Electrochemical Society, 159(6), H582, 2012 |
| 6 |
Complexing Between Additives and Ceria Abrasives Used for Polishing Silicon Dioxide and Silicon Nitride Films
Wang LY, Liu B, Song ZT, Liu WL, Feng SL, Huang D, Babu SV
Electrochemical and Solid State Letters, 14(3), H128, 2011 |
| 7 |
Chemical Mechanical Polishing of Ge Using Colloidal Silica Particles and H2O2
Peddeti S, Ong P, Leunissen LHA, Babu SV
Electrochemical and Solid State Letters, 14(7), H254, 2011 |
| 8 |
Controlling the Galvanic Corrosion of Copper during Chemical Mechanical Planarization of Ruthenium Barrier Films
Peethala BC, Roy D, Babu SV
Electrochemical and Solid State Letters, 14(7), H306, 2011 |
| 9 |
Electrochemical investigation of the roles of oxyanions in chemical-mechanical planarization of tantalum and tantalum nitride
Sulyma CM, Pettit CM, Surisetty CVVS, Babu SV, Roy D
Journal of Applied Electrochemistry, 41(5), 561, 2011 |
| 10 |
Ruthenium Polishing Using Potassium Periodate as the Oxidizer and Silica Abrasives
Peethala BC, Babu SV
Journal of the Electrochemical Society, 158(3), H271, 2011 |
