화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Atomic layer deposition of tungsten using sequential surface chemistry with a sacrificial stripping reaction
Klaus JW, Ferro SJ, George SM
Thin Solid Films, 360(1-2), 145, 2000
2 Effect of water dose on the atomic layer deposition rate of oxide thin films
Matero R, Rahtu A, Ritala M, Leskela M, Sajavaara T
Thin Solid Films, 368(1), 1, 2000
3 Initial stage of the catalyzed growth of SiO2 films on Si(001): An ab initio study
Okamoto Y
Journal of Physical Chemistry B, 103(50), 11074, 1999