| 1 |
Synthesis and Characterization of Oxygen Vacancy Induced Narrow Bandgap Tungsten Oxide (WO3-x) Nanoparticles by Plasma Discharge in Liquid and Its Photocatalytic Activity
Boruah PJ, Khanikar RR, Bailung H
Plasma Chemistry and Plasma Processing, 40(4), 1019, 2020 |
| 2 |
Comparative study of nanocomposites prepared by pulsed and dc sputtering combined with plasma polymerization suitable for photovoltaic device applications
Hussain AA, Pal AR, Kar R, Bailung H, Chutia J, Patil DS
Materials Chemistry and Physics, 148(3), 540, 2014 |
| 3 |
Growth of nanocrystalline TiO2 thin films and crystal anisotropy of anatase phase deposited by direct current reactive magnetron sputtering
Sarma BK, Pal AR, Bailung H, Chutia J
Materials Chemistry and Physics, 139(2-3), 979, 2013 |
| 4 |
Role of ion energy on growth and optical dispersion of nanocrystalline TiO2 films prepared by magnetron sputtering with ion assistance at the substrate
Sarma BK, Pal AR, Bailung H, Chutia J
Applied Surface Science, 258(15), 5659, 2012 |
| 5 |
Plasma process for development of a bulk heterojunction optoelectronic device: A highly sensitive UV detector
Sharma S, Pal AR, Chutia J, Bailung H, Sarma NS, Dass NN, Patil D
Applied Surface Science, 258(20), 7897, 2012 |
| 6 |
Role of Plasma Parameters on the Conjugated Structure Retention in Polyaniline Thin Film
Hussain AA, Sharma S, Pal AR, Bailung H, Chutia J, Patil DS
Plasma Chemistry and Plasma Processing, 32(4), 817, 2012 |
| 7 |
TiO2/polyaniline nanocomposite films prepared by magnetron sputtering combined with plasma polymerization process
Pal AR, Sarma BK, Adhikary NC, Chutia J, Bailung H
Applied Surface Science, 258(3), 1199, 2011 |
| 8 |
Extended Conjugation in Polyaniline Like Structure Prepared by Plasma Polymerization Suitable for Optoelectronic Applications
Sarma BK, Pal AR, Bailung H, Chutia J
Plasma Chemistry and Plasma Processing, 31(5), 741, 2011 |
| 9 |
Deposition of nanostructured crystalline and corrosion resistant alumina film on bell metal at low temperature by rf magnetron sputtering
Kakati H, Pal AR, Bailung H, Chutia J
Applied Surface Science, 255(16), 7403, 2009 |
| 10 |
Optimization of plasma parameters for high rate deposition of titanium nitride films as protective coating on bell-metal by reactive sputtering in cylindrical magnetron device
Borah SM, Pal AR, Bailung H, Chutia J
Applied Surface Science, 254(18), 5760, 2008 |
