검색결과 : 13건
| No. | Article |
|---|---|
| 1 |
Quantifying lithium in the solid electrolyte interphase layer and beyond using Lithium-Nuclear Reaction Analysis technique Schulz A, Bakhru H, DeRosa D, Higashiya S, Rane-Fondacaro M, Haldar P Journal of Power Sources, 360, 129, 2017 |
| 2 |
Fabrication of freestanding LiNbO3 thin films via He implantation and femtosecond laser ablation Gaathon O, Ofan A, Dadap JI, Vanamurthy L, Bakhru S, Bakhru H, Osgood RM Journal of Vacuum Science & Technology A, 28(3), 462, 2010 |
| 3 |
Interface properties of MBE-grown MOS structures with InGaAs/InAlAs buried channel and in-situ high-k oxide Oktyabrsky S, Tokranov V, Koveshnikov S, Yakimov M, Kambhampati R, Bakhru H, Moore R, Tsai W Journal of Crystal Growth, 311(7), 1950, 2009 |
| 4 |
Oxide heterogrowth on ion-exfoliated thin-film complex oxide substrates Chen TL, Kou A, Ofan A, Gaathon O, Osgood RM, Gang O, Vanamurthy L, Bakhru S, Bakhru H Thin Solid Films, 518(1), 269, 2009 |
| 5 |
Thermal stability study of pore sealing using parylene N Ou Y, Wang PI, Vanamurthy LH, Bakhru H, Lu TM, Spencer G Journal of the Electrochemical Society, 155(10), H819, 2008 |
| 6 |
Stability of Cu on epoxy siloxane polymer under bias temperature stress Wang PI, Juneja JS, Murarka SP, Lu TM, Jezewski C, Ghoshal R, Ghoshal R, Bakhru H Journal of the Electrochemical Society, 153(4), G358, 2006 |
| 7 |
Bias-temperature stability of Ti-Si-N-O films Ee YC, Juneja JS, Wang PI, Lu TM, Bakhru H, Chan L, Law SB, Yong C, Chen Z, Xu S Journal of the Electrochemical Society, 153(5), G470, 2006 |
| 8 |
Evaluation of a novel Cu(I) precursor for chemical vapor deposition Ye DX, Carrow B, Pimanpang S, Bakhru H, Ten Eyck GA, Wang GC, Lu TM Electrochemical and Solid State Letters, 8(7), C85, 2005 |
| 9 |
Pressure dependent Parylene-N pore sealant penetration in porous low-kappa dielectrics Juneja JS, Ten Eyck GA, Bakhru H, Lu TM Journal of Vacuum Science & Technology B, 23(5), 2232, 2005 |
| 10 |
Preliminary evaluation of interfacial stability of surface modified porous methyl silsesquioxane by ion implantation for copper metallization scheme Patel ZP, Roy ANU, Bakhru H, Lu TM Thin Solid Films, 476(2), 322, 2005 |