검색결과 : 52건
No. | Article |
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1 |
Evaluation of Mechanical Properties of Porous OSG Films by PFQNM AFM and Benchmarking with Traditional Instrumentation Ovchinnikov IS, Vishnevskiy AS, Seregin DS, Rezvanov AA, Schneider D, Sigov AS, Vorotilov KA, Baklanov MR Langmuir, 36(32), 9377, 2020 |
2 |
Effect of the C-bridge on UV properties of organosilicate films Seregin DS, Naumov S, Chang WY, Wu YH, Wang Y, Kotova NM, Vishnevskiy AS, Wei S, Zhang J, Vorotilov KA, Redzheb M, Leu J, Baklanov MR Thin Solid Films, 685, 329, 2019 |
3 |
Influence of Current Density on Orientation-Controllable Growth and Characteristics of Electrochemically Deposited Au Films Liu LT, Zhu XL, Wei SH, Zhang J, Baklanov MR, Fanta ABD, Niu JB, Xie CQ Journal of the Electrochemical Society, 166(1), D3232, 2018 |
4 |
The effects of vacuum-ultraviolet radiation on defects in low-k organosilicate glass (SiCOH) as measured with electron-spin resonance Xue PP, Pei DF, Zheng HF, Li WY, Afanas'ev VV, Baklanov MR, de Marneffe JF, Lin YH, Fung HS, Chen CC, Nishi Y, Shohet JL Thin Solid Films, 616, 23, 2016 |
5 |
Study of porogen removal by atomic hydrogen generated by hot wire chemical vapor deposition for the fabrication of advanced low-k thin films Godavarthi S, Wang C, Verdonck P, Matsumoto Y, Koudriavtsev I, Dutt A, Tielens H, Baklanov MR Thin Solid Films, 575, 103, 2015 |
6 |
Impact of Plasma Pretreatment and Pore Size on the Sealing of Ultra-Low-k Dielectrics by Self-Assembled Monolayers Sun YT, Krishtab M, Struyf H, Verdonck P, De Feyter S, Baklanov MR, Armini S Langmuir, 30(13), 3832, 2014 |
7 |
Study of Chemical Vapor Deposition of Manganese on Porous SiCOH Low-k Dielectrics Using Bis(ethylcyclopentadienyl)manganese Jourdan N, Krishtab MB, Baklanov MR, Meersschaut J, Wilson CJ, Ablett JM, Fonda E, Zhao L, Van Elshocht S, Tokei Z, Vancoille E Electrochemical and Solid State Letters, 15(5), H176, 2012 |
8 |
In Situ Monitoring of Atomic Layer Deposition in Nanoporous Thin Films Using Ellipsometric Porosimetry Dendooven J, Devloo-Casier K, Levrau E, Van Hove R, Sree SP, Baklanov MR, Martens JA, Detavernier C Langmuir, 28(8), 3852, 2012 |
9 |
Effect of ultraviolet curing wavelength on low-k dielectric material properties and plasma damage resistance Marsik P, Urbanowicz AM, Verdonck P, De Roest D, Sprey H, Baklanov MR Thin Solid Films, 519(11), 3619, 2011 |
10 |
Influence of the ion bombardment of O-2 plasmas on low-k materials Verdonck P, Samara V, Goodyear A, Ferchichi A, Van Besien E, Baklanov MR, Braithwaite N Thin Solid Films, 520(1), 464, 2011 |