화학공학소재연구정보센터
검색결과 : 52건
No. Article
1 Evaluation of Mechanical Properties of Porous OSG Films by PFQNM AFM and Benchmarking with Traditional Instrumentation
Ovchinnikov IS, Vishnevskiy AS, Seregin DS, Rezvanov AA, Schneider D, Sigov AS, Vorotilov KA, Baklanov MR
Langmuir, 36(32), 9377, 2020
2 Effect of the C-bridge on UV properties of organosilicate films
Seregin DS, Naumov S, Chang WY, Wu YH, Wang Y, Kotova NM, Vishnevskiy AS, Wei S, Zhang J, Vorotilov KA, Redzheb M, Leu J, Baklanov MR
Thin Solid Films, 685, 329, 2019
3 Influence of Current Density on Orientation-Controllable Growth and Characteristics of Electrochemically Deposited Au Films
Liu LT, Zhu XL, Wei SH, Zhang J, Baklanov MR, Fanta ABD, Niu JB, Xie CQ
Journal of the Electrochemical Society, 166(1), D3232, 2018
4 The effects of vacuum-ultraviolet radiation on defects in low-k organosilicate glass (SiCOH) as measured with electron-spin resonance
Xue PP, Pei DF, Zheng HF, Li WY, Afanas'ev VV, Baklanov MR, de Marneffe JF, Lin YH, Fung HS, Chen CC, Nishi Y, Shohet JL
Thin Solid Films, 616, 23, 2016
5 Study of porogen removal by atomic hydrogen generated by hot wire chemical vapor deposition for the fabrication of advanced low-k thin films
Godavarthi S, Wang C, Verdonck P, Matsumoto Y, Koudriavtsev I, Dutt A, Tielens H, Baklanov MR
Thin Solid Films, 575, 103, 2015
6 Impact of Plasma Pretreatment and Pore Size on the Sealing of Ultra-Low-k Dielectrics by Self-Assembled Monolayers
Sun YT, Krishtab M, Struyf H, Verdonck P, De Feyter S, Baklanov MR, Armini S
Langmuir, 30(13), 3832, 2014
7 Study of Chemical Vapor Deposition of Manganese on Porous SiCOH Low-k Dielectrics Using Bis(ethylcyclopentadienyl)manganese
Jourdan N, Krishtab MB, Baklanov MR, Meersschaut J, Wilson CJ, Ablett JM, Fonda E, Zhao L, Van Elshocht S, Tokei Z, Vancoille E
Electrochemical and Solid State Letters, 15(5), H176, 2012
8 In Situ Monitoring of Atomic Layer Deposition in Nanoporous Thin Films Using Ellipsometric Porosimetry
Dendooven J, Devloo-Casier K, Levrau E, Van Hove R, Sree SP, Baklanov MR, Martens JA, Detavernier C
Langmuir, 28(8), 3852, 2012
9 Effect of ultraviolet curing wavelength on low-k dielectric material properties and plasma damage resistance
Marsik P, Urbanowicz AM, Verdonck P, De Roest D, Sprey H, Baklanov MR
Thin Solid Films, 519(11), 3619, 2011
10 Influence of the ion bombardment of O-2 plasmas on low-k materials
Verdonck P, Samara V, Goodyear A, Ferchichi A, Van Besien E, Baklanov MR, Braithwaite N
Thin Solid Films, 520(1), 464, 2011