화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Ultra-thin silicon oxide layers on crystalline silicon wafers: Comparison of advanced oxidation techniques with respect to chemically abrupt SiO2/Si interfaces with low defect densities
Stegemann B, Gad KM, Balamou P, Sixtensson D, Vossing D, Kasemann M, Angermann H
Applied Surface Science, 395, 78, 2017
2 Improved Si/SiOx interface passivation by ultra-thin tunneling oxide layers prepared by rapid thermal oxidation
Gad KM, Vossing D, Balamou P, Hiller D, Stegemann B, Angermann H, Kasemann M
Applied Surface Science, 353, 1269, 2015