화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Thermodynamical computation and physicochemical characterization of thin films deposited by electric-discharge-assisted chemical vapor deposition
Sassi Z, Chafik K, Bureau JC, Glachant A, Balland B
Applied Surface Science, 193(1-4), 26, 2002
2 Ionic Contamination in Metal-Oxide-Semiconductor Al/SiO2/3C-SiC Capacitors
Raynaud C, Autran JL, Briot JB, Balland B, Becourt N, Jaussaud C
Journal of the Electrochemical Society, 142(1), 282, 1995
3 Low-Energy (3-100 eV) Electron-Bombardment-Induced Nitridation of Thin SiO2-Films - Physicochemical and Electrical Analyses
Glachant A, Garcia V, Balland B, Bureau JC, Plossu C, Dupuy JC, Straboni A
Thin Solid Films, 238(1), 31, 1994