검색결과 : 12건
| No. | Article |
|---|---|
| 1 |
Chromium(III) Bis-Arylterpyridyl Complexes with Enhanced Visible Absorption via Incorporation of Intraligand Charge-Transfer Transitions Barbour JC, Kim AJI, deVries E, Shaner SE, Lovaasen BM Inorganic Chemistry, 56(14), 8212, 2017 |
| 2 |
Current Measurements from Multiple Pitting Sites in Engineered Aluminum Electrodes Missert N, Copeland RG, Johnson CM, Barbour JC Journal of the Electrochemical Society, 159(6), C259, 2012 |
| 3 |
A critical implanted Cl concentration for pit initiation on aluminum thin films Serna LM, Zavadil KR, Johnson CM, Wall FD, Barbour JC Journal of the Electrochemical Society, 153(8), B289, 2006 |
| 4 |
Effect of implanted Cl and deposited oxides on the pitting behavior of aluminum Serna LM, Johnson CM, Wall FD, Barbour JC Journal of the Electrochemical Society, 152(7), B244, 2005 |
| 5 |
Comparison of the effects of implanted and aqueous Cl on aluminum pitting behavior Wall FD, Johnson CM, Barbour JC, Martinez MA Electrochemical and Solid State Letters, 7(11), B35, 2004 |
| 6 |
The effects of chloride implantation on pit initiation in aluminum Wall FD, Johnson CM, Barbour JC, Martinez MA Journal of the Electrochemical Society, 151(2), B77, 2004 |
| 7 |
Hydration of passive oxide films on aluminum Bunker BC, Nelson GC, Zavadil KR, Barbour JC, Wall FD, Sullivan JP, Windisch CF, Engelhardt MH Journal of Physical Chemistry B, 106(18), 4705, 2002 |
| 8 |
Growth and oxidation of thin film Al2Cu Son KA, Missert N, Barbour JC, Hren JJ, Copeland RG, Minor KG Journal of the Electrochemical Society, 148(7), B260, 2001 |
| 9 |
Low Dielectric-Constant, Fluorine-Doped SiO2 for Intermetal Dielectric Denison DR, Barbour JC, Burkhart JH Journal of Vacuum Science & Technology A, 14(3), 1124, 1996 |
| 10 |
Thin-Film Tantalum Nitride Resistor Technology for Phosphide-Based Optoelectronics Lovejoy ML, Patrizi GA, Rieger DJ, Barbour JC Thin Solid Films, 290-291, 513, 1996 |