화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Use of 3-aminopropyltriethoxysilane deposited from aqueous solution for surface modification of III-V materials
Knorr DB, Williams KS, Baril NF, Weiland C, Andzelm JW, Lenhart JL, Woicik JC, Fischer DA, Tidrow MZ, Bandara SV, Henry NC
Applied Surface Science, 320, 414, 2014
2 Confined High-Pressure Chemical Deposition of Hydrogenated Amorphous Silicon
Baril NF, He RR, Day TD, Sparks JR, Keshavarzi B, Krishnamurthi M, Borhan A, Gopalan V, Peacock AC, Healy N, Sazio PJA, Badding JV
Journal of the American Chemical Society, 134(1), 19, 2012
3 High-Pressure Chemical Deposition for Void-Free Filling of Extreme Aspect Ratio Templates
Baril NF, Keshavarzi B, Sparks JR, Krishnamurthi M, Temnykh I, Sazio PJA, Peacock AC, Borhan A, Gopalan V, Badding JV
Advanced Materials, 22(41), 4605, 2010