검색결과 : 23건
No. | Article |
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1 |
Atomic layer deposition of tantalum oxide thin films using the precursor tert-butylimido-tris-ethylmethylamido-tantalum and water: Process characteristics and film properties Henke T, Knaut M, Geidel M, Winkler F, Albert M, Bartha JW Thin Solid Films, 627, 94, 2017 |
2 |
Atomic Layer Deposition for Coating of High Aspect Ratio TiO2 Nanotube Layers Zazpe R, Kraut M, Sopha H, Hromadko L, Albert M, Prikryl J, Gartnerova V, Bartha JW, Macak JM Langmuir, 32(41), 10551, 2016 |
3 |
High efficiency high rate microcrystalline silicon thin-film solar cells deposited at plasma excitation frequencies larger than 100 MHz Strobel C, Leszczynska B, Merkel U, Kuske J, Fischer DD, Albert M, Holovsky J, Michard S, Bartha JW Solar Energy Materials and Solar Cells, 143, 347, 2015 |
4 |
Analysis of the energy input during wire coating from a cylindrical magnetron source Vogel U, Klaus C, Nobis C, Bartha JW Thin Solid Films, 520(20), 6404, 2012 |
5 |
Microstructure of electroplated Cu(Ag) alloy thin films Strehle S, Menzel S, Wetzig K, Bartha JW Thin Solid Films, 519(11), 3522, 2011 |
6 |
Temperature dependence of the sticking coefficient in atomic layer deposition Rose M, Bartha JW, Endler I Applied Surface Science, 256(12), 3778, 2010 |
7 |
Atomic Layer Deposition of Ta-N-Based Thin Films Using a Tantalum Source Schmidt D, Knaut M, Hossbach C, Albert M, Dussarrat C, Hintze B, Bartha JW Journal of the Electrochemical Society, 157(6), H638, 2010 |
8 |
Enhancing epitaxial SixC1-x deposition by adding Ge Ostermay I, Kammler T, Bartha JW, Kucher P Thin Solid Films, 518(10), 2834, 2010 |
9 |
Electrical characterisation of HfYO MIM-structures deposited by ALD Roessler T, Gluch J, Albert M, Bartha JW Thin Solid Films, 518(16), 4680, 2010 |
10 |
Method to determine the sticking coefficient of precursor molecules in atomic layer deposition Rose M, Bartha JW Applied Surface Science, 255(13-14), 6620, 2009 |