화학공학소재연구정보센터
검색결과 : 23건
No. Article
1 Atomic layer deposition of tantalum oxide thin films using the precursor tert-butylimido-tris-ethylmethylamido-tantalum and water: Process characteristics and film properties
Henke T, Knaut M, Geidel M, Winkler F, Albert M, Bartha JW
Thin Solid Films, 627, 94, 2017
2 Atomic Layer Deposition for Coating of High Aspect Ratio TiO2 Nanotube Layers
Zazpe R, Kraut M, Sopha H, Hromadko L, Albert M, Prikryl J, Gartnerova V, Bartha JW, Macak JM
Langmuir, 32(41), 10551, 2016
3 High efficiency high rate microcrystalline silicon thin-film solar cells deposited at plasma excitation frequencies larger than 100 MHz
Strobel C, Leszczynska B, Merkel U, Kuske J, Fischer DD, Albert M, Holovsky J, Michard S, Bartha JW
Solar Energy Materials and Solar Cells, 143, 347, 2015
4 Analysis of the energy input during wire coating from a cylindrical magnetron source
Vogel U, Klaus C, Nobis C, Bartha JW
Thin Solid Films, 520(20), 6404, 2012
5 Microstructure of electroplated Cu(Ag) alloy thin films
Strehle S, Menzel S, Wetzig K, Bartha JW
Thin Solid Films, 519(11), 3522, 2011
6 Temperature dependence of the sticking coefficient in atomic layer deposition
Rose M, Bartha JW, Endler I
Applied Surface Science, 256(12), 3778, 2010
7 Atomic Layer Deposition of Ta-N-Based Thin Films Using a Tantalum Source
Schmidt D, Knaut M, Hossbach C, Albert M, Dussarrat C, Hintze B, Bartha JW
Journal of the Electrochemical Society, 157(6), H638, 2010
8 Enhancing epitaxial SixC1-x deposition by adding Ge
Ostermay I, Kammler T, Bartha JW, Kucher P
Thin Solid Films, 518(10), 2834, 2010
9 Electrical characterisation of HfYO MIM-structures deposited by ALD
Roessler T, Gluch J, Albert M, Bartha JW
Thin Solid Films, 518(16), 4680, 2010
10 Method to determine the sticking coefficient of precursor molecules in atomic layer deposition
Rose M, Bartha JW
Applied Surface Science, 255(13-14), 6620, 2009