검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
157 nm: Deepest deep-ultraviolet yet Rothschild M, Bloomstein TM, Curtin JE, Downs DK, Fedynyshyn TH, Hardy DE, Kunz RR, Liberman V, Sedlacek JHC, Uttaro RS, Bates AK, Van Peski C Journal of Vacuum Science & Technology B, 17(6), 3262, 1999 |
| 2 |
Materials issues for optical components and photomasks in 157 nm lithography Liberman V, Bloomstein TM, Rothschild M, Sedlacek JHC, Uttaro RS, Bates AK, Van Peski C, Orvek K Journal of Vacuum Science & Technology B, 17(6), 3273, 1999 |