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| No. | Article |
|---|---|
| 1 |
Optimizing HiPIMS pressure for deposition of high-k (k=18.3) amorphous HfO2 Ganesan R, Murdoch BJ, Partridge JG, Bathgate S, Treverrow B, Dong X, Ross AE, McCulloch DG, McKenzie DR, Bilek MMM Applied Surface Science, 365, 336, 2016 |