검색결과 : 25건
| No. | Article |
|---|---|
| 1 |
Washing-resistant surfactant coated surface is able to inhibit pathogenic bacteria adhesion Treter J, Bonatto F, Krug C, Soares GV, Baumvol IJR, Macedo AJ Applied Surface Science, 303, 147, 2014 |
| 2 |
An experimental method for the determination of metal-polymer adhesion Gasparin AL, Wanke CH, Nunes RCR, Tentardini EK, Figueroa CA, Baumvol IJR, Oliveira RVB Thin Solid Films, 534, 356, 2013 |
| 3 |
Evolution of the Al2O3/Ge(100) interface for reactively sputter-deposited films submitted to postdeposition anneals Bom NM, Soares GV, Krug C, Pezzi RP, Baumvol IJR, Radtke C Applied Surface Science, 258(15), 5707, 2012 |
| 4 |
Effect of deposition temperature on microstructure and corrosion resistance of ZrN thin films deposited by DC reactive magnetron sputtering Roman D, Bernardi J, de Amorim CLG, de Souza FS, Spinelli A, Giacomelli C, Figueroa CA, Baumvol IJR, Basso RLO Materials Chemistry and Physics, 130(1-2), 147, 2011 |
| 5 |
Physicochemical and Electrical Properties of LaLuO3/Ge(100) Structures Submitted to Postdeposition Annealings Radtke C, Krug C, Soares GV, Baumvol IJR, Lopes JMJ, Durgun-Ozben E, Nichau A, Schubert J, Mantl S Electrochemical and Solid State Letters, 13(5), G37, 2010 |
| 6 |
H Quantification and Profiling in SiO2/SiC Submitted to Annealing in Water Vapor Soares GV, Baumvol IJR, Correa SA, Radtke C, Stedile FC Electrochemical and Solid State Letters, 13(11), G95, 2010 |
| 7 |
Physicochemical and structural characteristics of TiC and VC thin films deposited by DC reactive magnetron sputtering Aguzzoli C, Figueroa CA, Soares GV, Baumvol IJR Journal of Materials Science, 45(18), 4994, 2010 |
| 8 |
Electronic structure and mechanical properties of plasma nitrided ferrous alloys Portolan E, Baumvol IJR, Figueroa CA Applied Surface Science, 255(13-14), 6661, 2009 |
| 9 |
Deuterium Trapping at the Pt/HfO2 Interface Driemeier C, Kanter MM, Miotti L, Soares GV, Baumvol IJR Electrochemical and Solid State Letters, 12(4), G9, 2009 |
| 10 |
Carbon occupancy of interstitial sites in vanadium carbide films deposited by direct current reactive magnetron sputtering Portolan E, Amorim CLG, Soares GV, Aguzzoli C, Perottoni CA, Baumvol IJR, Figueroa CA Thin Solid Films, 517(24), 6493, 2009 |