검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Using ellipsometry for assessment of TiN surface roughness after plasma etch Shamiryan D, Paraschiv V, Dictus D, Baklanov MR, Beckx S, Boullart W Journal of the Electrochemical Society, 155(2), H108, 2008 |
| 2 |
Profile control of novel non-Si gates using BCl3/N-2 plasma Shamiryan D, Paraschiv V, Eslava-Fernandez S, Demand M, Baklanov M, Beckx S, Boullart W Journal of Vacuum Science & Technology B, 25(3), 739, 2007 |
| 3 |
Influence of TaN gate electrode microstructure on its dry etch properties Shamiryan D, Paraschiv V, Tokei Z, Beckx S, Boullart W Electrochemical and Solid State Letters, 9(8), G272, 2006 |
| 4 |
Influence of oxide hard mask on profiles of sub-100 nm Si and SiGe gates Shamiryan D, Paraschiv V, Locorotondo S, Beckx S, Boullart W, Vanhaelemeersch S Journal of Vacuum Science & Technology B, 23(5), 2194, 2005 |