검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
SiO2 etch rate modification by ion implantation Bellandi E, Soncini V Thin Solid Films, 524, 75, 2012 |
| 2 |
Automated metrology system including VUV spectroscopic ellipsometry and X-ray reflectometry for 300 mm silicon microelectronics Boher R, Evrard R, Condat O, Dos Reis C, Defranoux C, Bellandi E Thin Solid Films, 450(1), 114, 2004 |
| 3 |
Metrology issues in thin ONO stacks measurements by spectroscopic ellipsometry and X-ray reflectivity Bellandi E, Elbaz A, Spadoni S, Piagge R, Coccorese C, Pavia G, Ferrari S, Banerjee S, Alessandri M Thin Solid Films, 450(1), 120, 2004 |
| 4 |
Automated metrology system including VUV spectroscopic ellipsometry and X-ray reflectometry for 300 mm silicon microelectronics Boher P, Evrard P, Condat O, Dos Reis C, Defranoux C, Piel JP, Stehle JL, Bellandi E Thin Solid Films, 455-56, 798, 2004 |