| 1 |
Self-aligned process for single electron transistors
Berg EW, Pang SW
Journal of Vacuum Science & Technology B, 19(5), 1925, 2001 |
| 2 |
Low-pressure etching of nanostructures and via holes using an inductively coupled plasma system
Berg EW, Pang SW
Journal of the Electrochemical Society, 146(2), 775, 1999 |
| 3 |
Cl-2 plasma passivation of etch induced damage in GaAs and InGaAs with an inductively coupled plasma source
Berg EW, Pang SW
Journal of Vacuum Science & Technology B, 17(6), 2745, 1999 |
| 4 |
Electrical and optical characteristics of etch induced damage in InGaAs
Berg EW, Pang SW
Journal of Vacuum Science & Technology B, 16(6), 3359, 1998 |
| 5 |
Time dependence of etch-induced damage generated by an electron cyclotron resonance source
Berg EW, Pang SW
Journal of Vacuum Science & Technology B, 15(6), 2643, 1997 |
| 6 |
In-Situ Fiber Optic Thermometry of Wafer Surface Etched with an Electron-Cyclotron-Resonance Source
Thomas S, Berg EW, Pang SW
Journal of Vacuum Science & Technology B, 14(3), 1807, 1996 |
| 7 |
Effects of Etch-Induced Damage on the Electrical Characteristics of Inplane Gated Quantum-Wire Transistors
Ko KK, Berg EW, Pang SW
Journal of Vacuum Science & Technology B, 14(6), 3663, 1996 |
