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| No. | Article |
|---|---|
| 1 |
Sheath Thickness in Very-High-Frequency Plasma Chemical-Vapor-Deposition of Hydrogenated Amorphous-Silicon Vansark WG, Meiling H, Hamers EA, Bezemer J, Vanderweg WF Journal of Vacuum Science & Technology A, 15(3), 654, 1997 |