검색결과 : 5건
| No. | Article |
|---|---|
| 1 |
Optical endpoint detection for chemical mechanical planarization Bibby T, Adams JA, Holland K Journal of Vacuum Science & Technology B, 17(5), 2378, 1999 |
| 2 |
Effects of carrier film physical properties on WCMP Wang D, Zutshi A, Bibby T, Beaudoin SP, Cale TS Thin Solid Films, 345(2), 278, 1999 |
| 3 |
Assessment of post-CMP cleaning mechanisms using statistically-designed experiments Zhang G, Burdick G, Dai F, Bibby T, Beaudoin S Thin Solid Films, 332(1-2), 379, 1998 |
| 4 |
Von-Mises Stress in Chemical-Mechanical Polishing Processes Wang D, Lee J, Holland K, Bibby T, Beaudoin S, Cale T Journal of the Electrochemical Society, 144(3), 1121, 1997 |
| 5 |
Stress distribution in chemical mechanical polishing Srinivasa-Murthy C, Wang D, Beaudoin SP, Bibby T, Holland K, Cale TS Thin Solid Films, 308-309, 533, 1997 |