검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Extreme ultraviolet lithography mask flatness and electrostatic chucking analysis Mikkelson A, Engelstad R, Lovell E, Blaedel K, Claudet A Journal of Vacuum Science & Technology B, 21(6), 3091, 2003 |
| 2 |
Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic Naulleau P, Goldberg KA, Anderson EH, Attwood D, Batson P, Bokor J, Denham P, Gullikson E, Harteneck B, Hoef B, Jackson K, Olynick D, Rekawa S, Salmassi F, Blaedel K, Chapman H, Hale L, Mirkarimi P, Soufli R, Spiller E, Sweeney D, Taylor J, Walton C, O'Connell D, Tichenor D, Gwyn CW, Yan PY, Zhang GJ Journal of Vacuum Science & Technology B, 20(6), 2829, 2002 |
| 3 |
Particle-induced distortion in extreme ultraviolet lithography reticles during exposure chucking Tejeda R, Engelstad R, Lovell E, Blaedel K Journal of Vacuum Science & Technology B, 20(6), 2840, 2002 |
| 4 |
First lithographic results from the extreme ultraviolet Engineering Test Stand Chapman HN, Ray-Chaudhuri AK, Tichenor DA, Replogle WC, Stulen RH, Kubiak GD, Rockett PD, Klebanoff LE, O'Connell D, Leung AH, Jefferson KL, Wronosky JB, Taylor JS, Hale LC, Blaedel K, Spiller EA, Sommargren GE, Folta JA, Sweeney DW, Gullikson EM, Naulleau P, Goldberg KA, Bokor J, Attwood DT, Mickan U, Hanzen R, Panning E, Yan PY, Gwyn CW, Lee SH Journal of Vacuum Science & Technology B, 19(6), 2389, 2001 |