검색결과 : 10건
| No. | Article |
|---|---|
| 1 |
A Nanoparticle Convective Directed Assembly Process for the Fabrication of Periodic Surface Enhanced Raman Spectroscopy Substrates Liberman V, Yilmaz C, Bloomstein TM, Somu S, Echegoyen Y, Busnaina A, Cann SG, Krohn KE, Marchant MF, Rothschild M Advanced Materials, 22(38), 4298, 2010 |
| 2 |
Immersion patterning down to 27 nm half pitch Bloomstein TM, Fedynyshyn TH, Pottebaum I, Marchant MF, Deneault SJ, Rothschild M Journal of Vacuum Science & Technology B, 24(6), 2789, 2006 |
| 3 |
Direct patterning of spin-on glass with 157 nm lithography: Application to nanoscale crystal growth Bloomstein TM, Juodawlkis PW, Swint RB, Cann SG, Deneault SJ, Efremow NN, Hardy DE, Marchant MF, Napoleone A, Oakley DC, Rothschild M Journal of Vacuum Science & Technology B, 23(6), 2617, 2005 |
| 4 |
Hybrid optical maskless lithography: Scaling beyond the 45 nm node Fritze M, Bloomstein TM, Tyrrell B, Fedynyshyn TH, Efremow NN, Hardy DE, Cann S, Lennon D, Spector S, Rothschild M, Brooker P Journal of Vacuum Science & Technology B, 23(6), 2743, 2005 |
| 5 |
Liquid immersion lithography: Why, how, and when? Rothschild M, Bloomstein TM, Kunz RR, Liberman V, Switkes M, Palmacci ST, Sedlacek JHC, Hardy D, Grenville A Journal of Vacuum Science & Technology B, 22(6), 2877, 2004 |
| 6 |
157 nm: Deepest deep-ultraviolet yet Rothschild M, Bloomstein TM, Curtin JE, Downs DK, Fedynyshyn TH, Hardy DE, Kunz RR, Liberman V, Sedlacek JHC, Uttaro RS, Bates AK, Van Peski C Journal of Vacuum Science & Technology B, 17(6), 3262, 1999 |
| 7 |
Outlook for 157 nm resist design Kunz RR, Bloomstein TM, Hardy DE, Goodman RB, Downs DK, Curtin JE Journal of Vacuum Science & Technology B, 17(6), 3267, 1999 |
| 8 |
Materials issues for optical components and photomasks in 157 nm lithography Liberman V, Bloomstein TM, Rothschild M, Sedlacek JHC, Uttaro RS, Bates AK, Van Peski C, Orvek K Journal of Vacuum Science & Technology B, 17(6), 3273, 1999 |
| 9 |
Critical issues in 157 nm lithography Bloomstein TM, Rothschild M, Kunz RR, Hardy DE, Goodman RB, Palmacci ST Journal of Vacuum Science & Technology B, 16(6), 3154, 1998 |
| 10 |
Lithography with 157 nm lasers Bloomstein TM, Horn MW, Rothschild M, Kunz RR, Palmacci ST, Goodman RB Journal of Vacuum Science & Technology B, 15(6), 2112, 1997 |