| 1 |
Poly(methyl methacrylate) as for microelectromechanical masking material system (MEMS) fabrication
Bodas DS, Gangal SA
Journal of Applied Polymer Science, 102(3), 2094, 2006 |
| 2 |
Deposition of indium nitride films by activated reactive evaporation process - a feasibility study
Patil SJ, Bodas DS, Mandale AB, Gangal SA
Applied Surface Science, 245(1-4), 73, 2005 |
| 3 |
Deposition of plasma-polymerized hydroxyethyl methacrylate (HEMA) on silicon in presence of argon plasma
Bodas DS, Desai SM, Gangal SA
Applied Surface Science, 245(1-4), 186, 2005 |
| 4 |
Deposition of PTFE thin films by RF plasma sputtering on < 100 > silicon substrates
Bodas DS, Mandale AB, Gangal SA
Applied Surface Science, 245(1-4), 202, 2005 |
| 5 |
RF sputter deposition of poly(tetrafluoroethylene) films as masking materials for silicon micromachining
Bodas DS, Patil SJ, Mandale AB, Gangal SA
Journal of Applied Polymer Science, 91(2), 1183, 2004 |
| 6 |
Characterization of indium nitride films deposited by activated reactive evaporation process
Patil SJ, Bodas DS, Mandale AB, Gangal SA
Thin Solid Films, 444(1-2), 52, 2003 |
