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| No. | Article |
|---|---|
| 1 |
Amorphous and microcrystalline silicon deposited by hot-wire chemical vapor deposition at low substrate temperatures: application to devices and thin-film microelectromechanical systems Conde JP, Alpuim P, Boucinha M, Gaspar J, Chu V Thin Solid Films, 395(1-2), 105, 2001 |