검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Reducing damage to Si substrates during gate etching processes by synchronous plasma pulsing Petit-Etienne C, Darnon M, Vallier L, Pargon E, Cunge G, Boulard F, Joubert O, Banna S, Lill T Journal of Vacuum Science & Technology B, 28(5), 926, 2010 |
| 2 |
Effect of Ar and N-2 addition on CH4-H-2 based chemistry inductively coupled plasma etching of HgCdTe Boulard F, Baylet J, Cardinaud C Journal of Vacuum Science & Technology A, 27(4), 855, 2009 |