검색결과 : 5건
| No. | Article |
|---|---|
| 1 |
Application of scatterometric porosimetry to characterize porous ultra low-k patterned layers Licitra C, Bouyssou R, El Kodadi M, Haberfehlner G, Chevolleau T, Hazart J, Virot L, Besacier M, Schiavone P, Bertin F Thin Solid Films, 519(9), 2825, 2011 |
| 2 |
Patterning of porous SiOCH using an organic mask: Comparison with a metallic masking strategy Darnon M, Chevolleau T, David T, Ducote J, Posseme N, Bouyssou R, Bailly F, Perret D, Joubert O Journal of Vacuum Science & Technology B, 28(1), 149, 2010 |
| 3 |
Scatterometric porosimetry: A new characterization technique for porous material patterned structures Bouyssou R, El Kodadi M, Licitra C, Chevolleau T, Besacier M, Posseme N, Joubert O, Schiavone P Journal of Vacuum Science & Technology B, 28(4), L31, 2010 |
| 4 |
Residue growth on metallic-hard mask after dielectric etching in fluorocarbon-based plasmas. I. Mechanisms Posseme N, Chevolleau T, Bouyssou R, David T, Arnal V, Barnes JP, Verove C, Joubert O Journal of Vacuum Science & Technology B, 28(4), 809, 2010 |
| 5 |
Multi-solvent ellipsometric porosimetry analysis of plasma-treated porous SiOCH films Licitra C, Bouyssou R, Chevolleau T, Bertin F Thin Solid Films, 518(18), 5140, 2010 |