검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
A simplified model for the etch rate of novolac-based photoresist Bray RP, Rhinehart RR Plasma Chemistry and Plasma Processing, 21(1), 149, 2001 |
| 2 |
A method of mechanistic model validation with a case study in plasma etching Bray RP, Rhinehart RR Plasma Chemistry and Plasma Processing, 21(1), 163, 2001 |