화학공학소재연구정보센터
검색결과 : 5건
No. Article
1 Highly porous silicon membrane fabrication using polymer self-assembly
Black CT, Guarini KW, Breyta G, Colburn MC, Ruiz R, Sandstrom RL, Sikorski EM, Zhang Y
Journal of Vacuum Science & Technology B, 24(6), 3188, 2006
2 Development of 157 nm positive resists
Ito H, Wallraff GM, Fender N, Brock PJ, Hinsberg WD, Mahorowala A, Larson CE, Truong HD, Breyta G, Allen RD
Journal of Vacuum Science & Technology B, 19(6), 2678, 2001
3 Monomer reactivities and kinetics in radical copolymerization of hydroxystyrene derivatives and tert-butyl (meth)acrylate
Ito H, Dalby C, Pomerantz A, Sherwood M, Sato R, Sooriyakumaran R, Guy K, Breyta G
Macromolecules, 33(14), 5080, 2000
4 Effect of Photo Acid Generator Concentration on the Process Latitude of a Chemically Amplified Resist
Petrillo KE, Pomerene AT, Babich ED, Seeger DE, Hofer D, Breyta G, Ito H
Journal of Vacuum Science & Technology B, 12(6), 3863, 1994
5 Single-Layer Chemically Amplified Photoresists for 193-nm Lithography
Wallraff GM, Allen RD, Hinsberg WD, Larson CF, Johnson RD, Dipietro R, Breyta G, Hacker N, Kunz RR
Journal of Vacuum Science & Technology B, 11(6), 2783, 1993