화학공학소재연구정보센터
검색결과 : 4건
No. Article
1 Concepts for in situ characterization and control of plasma ion assisted deposition processes
Harhausen J, Foest R, Stenzel O, Wilbrandt S, Franke C, Brinkmann RP
Thin Solid Films, 673, 94, 2019
2 Energetic neutral fluxes towards surfaces-in a magnetically enhanced reactive ion etch-like reactor
Sabisch W, Kratzer M, Brinkmann RP
Journal of Vacuum Science & Technology A, 21(4), 1205, 2003
3 A Reduced-Fluid Dynamic Discharge Model for Applications in Technology-Oriented Computer-Aided-Design
Brinkmann RP, Furst R, Werner C, Hierlemann M
Journal of the Electrochemical Society, 143(6), 1940, 1996
4 The Effect of the Presheath on the Ion Angular-Distribution at the Wafer Surface
Zheng J, Brinkmann RP, Mcvittie JP
Journal of Vacuum Science & Technology A, 13(3), 859, 1995