검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Hydrogen silsesquioxane-based hybrid electron beam and optical lithography for high density circuit prototyping Guillorn M, Chang J, Fuller N, Patel J, Darnon M, Pyzyna A, Joseph E, Engelmann S, Ott J, Newbury J, Klaus D, Bucchignano J, Joshi P, Scerbo C, Kratschmer E, Graham W, To B, Parisi J, Zhang Y, Haensch W Journal of Vacuum Science & Technology B, 27(6), 2588, 2009 |
| 2 |
Sub-50 nm half-pitch imaging,with a low activation energy chemically amplified photoresist Wallraff GM, Medeiros DR, Sanchez M, Petrillo K, Huang WS, Rettner C, Davis B, Larson CE, Sundberg L, Brock PJ, Hinsberg WD, Houle FA, Hoffnagle JA, Goldfarb D, Temple K, Wind S, Bucchignano J Journal of Vacuum Science & Technology B, 22(6), 3479, 2004 |
| 3 |
Chemically amplified resist processing with top coats for deep-ultraviolet and e-beam applications Petrillo K, Bucchignano J, Angelopoulos M, Cornett K, Brunsvold W Journal of Vacuum Science & Technology B, 16(6), 3709, 1998 |
| 4 |
Ultrasonic and dip resist development processes for 50 nm device fabrication Lee KL, Bucchignano J, Gelorme J, Viswanathan R Journal of Vacuum Science & Technology B, 15(6), 2621, 1997 |