화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
Putkonen M, Bosund M, Ylivaara OME, Puurunen RL, Kilpi L, Ronkainen H, Sintonen S, Ali S, Lipsanen H, Liu XW, Haimi E, Hannula SP, Sajavaara T, Buchanan I, Karwacki E, Vaha-Nissi M
Thin Solid Films, 558, 93, 2014
2 New Volatile Strontium and Barium Imidazolate Complexes for the Deposition of Group 2 Metal Oxides
Norman JAT, Perez M, Kim MS, Lei XJ, Ivanov S, Derecskei-Kovacs A, Matz L, Buchanan I, Rheingold AL
Inorganic Chemistry, 50(24), 12396, 2011