검색결과 : 6건
| No. | Article |
|---|---|
| 1 |
Chemically amplified deep ultraviolet resist for positive tone ion exposure Bruenger WH, Torkler M, Buchmann LM, Finkelstein W Journal of Vacuum Science & Technology B, 15(6), 2355, 1997 |
| 2 |
Hpr-506 Photoresist Used as a Positive Tone Ion Resist Bruenger WH, Buchmann LM, Torkler M, Sinkwitz S Journal of Vacuum Science & Technology B, 14(6), 3924, 1996 |
| 3 |
Damage Characterization of Ion-Beam Exposed Metal-Oxide-Semiconductor Varactor Cells by Charge to Breakdown Measurements Brunger WH, Buchmann LM, Naumann F, Friedrich D, Finkelstein W, Mohondro R Journal of Vacuum Science & Technology B, 13(6), 2561, 1995 |
| 4 |
Experimental Investigation of Stochastic Space-Charge Effects on Pattern Resolution in Ion Projection Lithography Systems Hammel E, Chalupka A, Fegerl J, Fischer R, Lammer G, Loschner H, Malek L, Nowak R, Stengl G, Vonach H, Wolf P, Brunger WH, Buchmann LM, Torkler M, Cekan E, Fallmann W, Paschke F, Stangl G, Thalinger F, Berry IL, Harriott LR, Finkelstein W, Hill RW Journal of Vacuum Science & Technology B, 12(6), 3533, 1994 |
| 5 |
Ion Projection Lithography over Wafer Topography Brunger WH, Buchmann LM, Torkler MA, Finkelstein W Journal of Vacuum Science & Technology B, 12(6), 3547, 1994 |
| 6 |
Edge Roughness of a 200-nm Pitch Resist Pattern Fabricated by Ion Projection Lithography Brunger WH, Blaschke J, Torkler M, Buchmann LM Journal of Vacuum Science & Technology B, 11(6), 2404, 1993 |