화학공학소재연구정보센터
검색결과 : 5건
No. Article
1 Excellent passivation with implied open-circuit voltage of 710 mV for p-type multi-crystalline black silicon using PECVD grown a-Si:H passivation layer
Lin YR, Feng MM, Wang ZX, Zeng YH, Liao MD, Gong LF, Yan BJ, Yuan ZZ, Ye JC
Solar Energy, 211, 753, 2020
2 Hot carrier degradation mechanism interpretation by lateral distribution of interface and bulk trap density
Chae H, Shin S, Choi J, Seo S
Current Applied Physics, 15(11), 1412, 2015
3 MOS hydrogen sensor with very fast response based on ulitra-thin thermal SiO2 film
Lu C, Chen Z
International Journal of Hydrogen Energy, 35(22), 12561, 2010
4 Trapping properties of sputtered hafnium oxide films: Bulk traps vs. interface traps
Verrelli E, Galanopoulos G, Zouboulis I, Tsoukalas D
Thin Solid Films, 518(19), 5579, 2010
5 Mechanisms for generation of oxide trapped charges in ultrathin silicon dioxide films during electrical stress
Samanta P
Solid-State Electronics, 52(2), 255, 2008