화학공학소재연구정보센터
검색결과 : 4건
No. Article
1 Fabrication of open stencil masks with asymmetric void ratio for the ion projection lithography space charge experiment
Volland B, Shi F, Heerlein H, Rangelow IW, Hudek P, Kostic I, Cekan E, Vonach H, Loeschner H, Horner C, Stengl G, Buschbeck H, Zeininger M, Bleeker A, Benschop J
Journal of Vacuum Science & Technology B, 18(6), 3202, 2000
2 Experimental results of the stochastic Coulomb interaction in ion projection lithography
de Jager PWH, Derksen G, Mertens B, Cekan E, Lammer G, Vonach H, Buschbeck H, Zeininger M, Horner C, Loschner H, Stengl G, Bleeker AJ, Benschop J, Shi F, Volland B, Hudek P, Heerlein H, Rangelow IW, Kaesmaier R
Journal of Vacuum Science & Technology B, 17(6), 3098, 1999
3 Deep ultraviolet resists AZ DX-561 and AZ DX-1300P applied for electron beam and masked ion beam lithography
Hudek P, Kostic I, Belov M, Rangelow IW, Shi F, Pawlowski G, Spiess W, Buschbeck H, Cekan E, Eder S, Loschner H
Journal of Vacuum Science & Technology B, 15(6), 2550, 1997
4 Novel Electrostatic Column for Ion Projection Lithography
Chalupka A, Stengl G, Buschbeck H, Lammer G, Vonach H, Fischer R, Hammel E, Loschner H, Nowak R, Wolf P, Finkelstein W, Hill RW, Berry IL, Harriott LR, Melngailis J, Randall JN, Wolfe JC, Stroh H, Wollnik H, Mondelli AA, Petillo JJ, Leung K
Journal of Vacuum Science & Technology B, 12(6), 3513, 1994