화학공학소재연구정보센터
검색결과 : 7건
No. Article
1 Comparison of pulsed and downstream deposition of fluorocarbon materials from C3F8 and c-C4F8 plasmas
Martin IT, Malkov GS, Butoi CI, Fisher ER
Journal of Vacuum Science & Technology A, 22(2), 227, 2004
2 Mechanisms for deposition and etching in fluorosilane plasma processing of silicon
Williams KL, Butoi CI, Fisher ER
Journal of Vacuum Science & Technology A, 21(5), 1688, 2003
3 Mechanisms and energy transfer for surface generation of NH2 during NH3 plasma processing of metal and polymer substrates
Butoi CI, Steen ML, Peers JRD, Fisher ER
Journal of Physical Chemistry B, 105(25), 5957, 2001
4 Identification of gas-phase reactive species and chemical mechanisms occurring at plasma-polymer surface interfaces
Steen ML, Butoi CI, Fisher ER
Langmuir, 17(26), 8156, 2001
5 Ion and substrate effects on surface reactions of CF2 using C2F6, C2F6/H-2, and hexafluoropropylene oxide plasmas
Butoi CI, Mackie NM, Williams KL, Capps NE, Fisher ER
Journal of Vacuum Science & Technology A, 18(6), 2685, 2000
6 Surface interactions of NH2 radicals in NH3 plasmas
McCurdy PR, Butoi CI, Williams KL, Fisher ER
Journal of Physical Chemistry B, 103(33), 6919, 1999
7 Electron-transfer dynamics in DTDCI/MoS2 and DTDCI/WS2 nanoclusters
Butoi CI, Langdon BT, Kelley DF
Journal of Physical Chemistry B, 102(48), 9635, 1998