화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Near-surface secondary-ion-mass-spectrometry analyses of plasma-based B ion implants in Si
Buyuklimanli TH, Magee CW, Marino JW, Walther SR
Journal of Vacuum Science & Technology B, 24(1), 408, 2006
2 Improved near surface characterization of shallow arsenic distribution by SIMS depth profiling
Buyuklimanli TH, Marino JW, Novak SW
Applied Surface Science, 231-2, 636, 2004
3 High-resolution depth profiling of ultrashallow boron implants in silicon using high-resolution RBS
Kimura K, Oota Y, Nakajima K, Buyuklimanli TH
Current Applied Physics, 3(1), 9, 2003