검색결과 : 5건
| No. | Article |
|---|---|
| 1 |
Proximity effect correction by the GHOST method using a scattering stencil mask Yamashita H, Nomura E, Manako S, Kobinata H, Nakajima K, Nozue H Journal of Vacuum Science & Technology B, 17(6), 2860, 1999 |
| 2 |
Mask bias requirement for 0.13 mu m e-beam block exposure lithography Takahashi K, Kanata H, Nara Y Journal of Vacuum Science & Technology B, 16(6), 3279, 1998 |
| 3 |
Effects of accelerating voltage and pattern size on electron scattering by electron-beam mask Yamashita H, Nomura E, Nozue H Journal of Vacuum Science & Technology B, 15(6), 2263, 1997 |
| 4 |
Modified Mask Methods for Pattern Accuracy Enhancement in Electron-Beam Lithography Sohda Y, Someda Y, Nakayama Y, Saitou N Journal of Vacuum Science & Technology B, 14(6), 3850, 1996 |
| 5 |
High-Speed Single-Layer-Resist Process and Energy-Dependent Aspect Ratios for 0.2-Mu-M Electron-Beam Lithography Murai F, Yamamoto J, Yamaguchi H, Okazaki S, Sato K, Hasegawa K, Hayakawa H Journal of Vacuum Science & Technology B, 12(6), 3874, 1994 |