검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Fluorine-doped SiO2 and fluorocarbon low-k dielectrics investigated by SIMS Cwil M, Kalisz M, Konarski P Applied Surface Science, 255(4), 1334, 2008 |
| 2 |
Etching of silicon nitride in CCl2F2, CHF3, SiF4, and SF6 reactive plasma: A comparative study Pant BD, Tandon US Plasma Chemistry and Plasma Processing, 19(4), 545, 1999 |
| 3 |
High density fluorocarbon etching of silicon in an inductively coupled plasma : Mechanism of etching through a thick steady state fluorocarbon layer Standaert TEFM, Schaepkens M, Rueger NR, Sebel PGM, Oehrlein GS, Cook JM Journal of Vacuum Science & Technology A, 16(1), 239, 1998 |
| 4 |
Nonequilibrium Glow-Discharge Fluorination of Polymer Surfaces Hopkins J, Badyal JP Journal of Physical Chemistry, 99(12), 4261, 1995 |