1 |
Close-spaced vapor transport reactor for III-V growth using HCI as the transport agent Funch CJ, Greenaway AL, Boucher JW, Weiss R, Welsh A, Aloni S, Boettcher SW Journal of Crystal Growth, 506, 147, 2019 |
2 |
Process optimization for homoepitaxial growth of thick 4H-SiC films via hydrogen chloride chemical vapor deposition Liu XF, Yan GG, Liu B, Shen ZW, Wen ZX, Chen J, Zhao WS, Wang L, Zhang F, Sun GS, Zeng YP Journal of Crystal Growth, 504, 7, 2018 |
3 |
Growth of thick and high crystalline quality InGaN layers on GaN (000(1)over-bar) substrate using tri-halide vapor phase epitaxy Hirasaki T, Eriksson M, Thieu QT, Karlsson F, Murakami H, Kumagai Y, Monemar B, Holtz PO, Koukitu A Journal of Crystal Growth, 456, 145, 2016 |
4 |
Epitaxial growth of SiC with chlorinated precursors on different off-angle substrates Leone S, Henry A, Janzen E, Nishizawa S Journal of Crystal Growth, 362, 170, 2013 |
5 |
Vapor pressure of aqueous choline chloride-based deep eutectic solvents (ethaline, glyceline, maline and reline) at 30-70 degrees C Wu SH, Caparanga AR, Leron RB, Li MH Thermochimica Acta, 544, 1, 2012 |
6 |
Partial and integral thermodynamic properties in the sodium chloride-water-1-butanol(iso-butanol) ternary systems Konstantinova NM, Motornova MS, Mamontov MN, Shishin DI, Uspenskaya IA Fluid Phase Equilibria, 309(1), 20, 2011 |
7 |
Enhanced growth and photoluminescence properties of SnxNy (x > y) nanowires grown by halide chemical vapor deposition Zervos M, Othonos A Journal of Crystal Growth, 316(1), 25, 2011 |
8 |
Vanadium doping using VCl4 source during the chloro-carbon epitaxial growth of 4H-SiC Krishnan B, Kotamraju S, Thirumalai RVKG, Koshka Y Journal of Crystal Growth, 321(1), 8, 2011 |
9 |
Low-temperature homoepitaxial growth of 4H-SiC with CH3Cl and SiCl4 precursors Kotamraju S, Krishnan B, Melnychuk G, Koshka Y Journal of Crystal Growth, 312(5), 645, 2010 |
10 |
Triangular defects in the low-temperature halo-carbon homoepitaxial growth of 4H-SiC Das H, Melnychuk G, Koshka Y Journal of Crystal Growth, 312(12-13), 1912, 2010 |