| 1 |
고밀도 플라즈마 발생장치 2차원 모델링
이상덕, 신치범, Berezhnoj S
HWAHAK KONGHAK, 39(1), 23, 2001 |
| 2 |
Spatially-averaged model for plasma etch processes : Comparison of different approaches to electron kinetics
Ahlrichs P, Riedel U, Warnatz J
Journal of Vacuum Science & Technology A, 16(3), 1560, 1998 |
| 3 |
FTIR Kinetic and Mechanistic Study of the Atmospheric Chemistry of Methyl Thiolformate
Patroescu IV, Barnes I, Becker KH
Journal of Physical Chemistry, 100(43), 17207, 1996 |
| 4 |
Simulations of a Feedback-Control Scheme for an Inductively-Coupled Plasma Source for Etching Applications
Yamada N, Ventzek PL, Sakai Y, Tagashira H, Kitamori K
Journal of the Electrochemical Society, 143(4), 1375, 1996 |
| 5 |
Simulations of Real-Time Control of 2-Dimensional Features in Inductively-Coupled Plasma Sources for Etching Applications
Ventzek PL, Yamada N, Sakai Y, Tagashira H, Kitamori K
Journal of Vacuum Science & Technology A, 13(5), 2456, 1995 |
| 6 |
Investigation of Electron Source and Ion Flux Uniformity in High Plasma-Density Inductively-Coupled Etching Tools Using 2-Dimensional Modeling
Ventzek PL, Grapperhaus M, Kushner MJ
Journal of Vacuum Science & Technology B, 12(6), 3118, 1994 |
