화학공학소재연구정보센터
검색결과 : 4건
No. Article
1 Correlation between the carbon and hydrogen contents with the gas species and the plasma impedance of silicon carbide films produced by PECVD technique
Martins R, Silva V, Aguas H, Cabrita A, Ferreira I, Fortunato E
Applied Surface Science, 184(1-4), 101, 2001
2 Silicon carbide photodiodes: Schottky and PINIP structures
Cabrita A, Pereira L, Brida D, Lopes A, Marques A, Ferreira I, Fortunato E, Martins R
Applied Surface Science, 184(1-4), 437, 2001
3 Thin film position sensitive detectors based on pin amorphous silicon carbide structures
Cabrita A, Figueiredo J, Pereira L, Aguas H, Silva V, Brida D, Ferreira I, Fortunato E, Martins R
Applied Surface Science, 184(1-4), 443, 2001
4 Role of ion bombardment and plasma impedance on the performances presented by undoped a-Si : H films
Martins R, Aguas H, Ferreira I, Silva V, Cabrita A, Fortunato E
Thin Solid Films, 383(1-2), 165, 2001