검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Properties of copper films prepared by chemical vapor deposition for advanced metallization of microelectronic devices Kroger R, Eizenberg M, Cong D, Yoshida N, Chen LY, Ramaswami S, Carl D Journal of the Electrochemical Society, 146(9), 3248, 1999 |
| 2 |
Characterization of Fluorinated Tetra Ethyl Ortho Silicate Oxide-Films Deposited in a Low-Pressure Plasma-Enhanced Chemical-Vapor-Deposition Reactor Weise MT, Selbrede SC, Arias LJ, Carl D Journal of Vacuum Science & Technology A, 15(3), 1399, 1997 |