| 1 |
Electrical Characterization of a Processing Plasma Chamber
Roth WC, Carlile RN, Ohanlon JF
Journal of Vacuum Science & Technology A, 15(6), 2930, 1997 |
| 2 |
Papers from the Dusty Plasmas - 95 Workshop on Generation, Transport, and Removal of Particles in Plasmas - Preface
Carlile RN
Journal of Vacuum Science & Technology A, 14(2), 489, 1996 |
| 3 |
Particle Trapping, Transport, and Charge in Capacitively and Inductively-Coupled Argon Plasmas in a Gaseous-Electronics-Conference-Reference-Cell
Collins SM, Brown DA, Ohanlon JF, Carlile RN
Journal of Vacuum Science & Technology A, 14(2), 634, 1996 |
| 4 |
Mapping of Radio-Frequency Plasma Potential Throughout a Particle Trapping Region Using an Emissive Probe
Kang JW, Carlile RN, Ohanlon JF, Collins SM
Journal of Vacuum Science & Technology A, 14(2), 639, 1996 |
| 5 |
Postplasma Particle Dynamics in a Gaseous Electronics Conference RF Reference Cell
Collins SM, Brown DA, Ohanlon JF, Carlile RN
Journal of Vacuum Science & Technology A, 13(6), 2950, 1995 |
| 6 |
Effects of Particle Clouds in a Plasma Etch System on Silicon Dioxide Wafer Contamination
Collins SM, Ohanlon JF, Carlile RN
Journal of Vacuum Science & Technology A, 12(4), 1397, 1994 |
