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| No. | Article |
|---|---|
| 1 |
The impact of non-uniform channel layer growth on device characteristics in state of the Art Si/SiGe/Si p-metal oxide semiconductor field effect transistors Chang ACK, Ross IM, Norris DJ, Cullis AG, Tang YT, Cerrina C, Evans AGR Thin Solid Films, 496(2), 306, 2006 |