화학공학소재연구정보센터
검색결과 : 43건
No. Article
1 Chemical bath deposition of CdS channel layer for fabrication of low temperature-processed thin-film-transistors
Kwon JH, Ahn JS, Yang H
Current Applied Physics, 13(1), 84, 2013
2 New method for the extraction of bulk channel mobility and flat-band voltage in junctionless transistors
Jeon DY, Park SJ, Mouis M, Barraud S, Kim GT, Ghibaudo G
Solid-State Electronics, 89, 139, 2013
3 Phosphorous passivation of the SiO2/4H-SiC interface
Sharma YK, Ahyi AC, Issacs-Smith T, Shen X, Pantelides ST, Zhu X, Feldman LC, Rozen J, Williams JR
Solid-State Electronics, 68, 103, 2012
4 The effect of nitrogen plasma anneals on interface trap density and channel mobility for 4H-SiC MOS devices
Zhu XG, Ahyi AC, Li MY, Chen ZJ, Rozen J, Feldman LC, Williams JR
Solid-State Electronics, 57(1), 76, 2011
5 A study on the electrical properties of ZnO based transparent TFTs
Barquinha P, Fortunato E, Goncalves A, Pimentel A, Marques A, Pereira L, Martins R
Materials Science Forum, 514-516, 68, 2006
6 High temperature rapid thermal oxidation and nitridation of 4H-SiC in diluted N2O and NO ambient
Kosugi R, Fukuda K, Arai K
Materials Science Forum, 483, 669, 2005
7 Effects of N2O anneal on channel mobility of 4H-SiC MOSFET and gate oxide reliability
Fujihira K, Tarui Y, Ohtsuka KI, Imaizumi M, Takami T
Materials Science Forum, 483, 697, 2005
8 Realisation of large area 3C-SiC MOSFETs
Schoner A, Bakowski M, Ericsson P, Stromberg H, Nagasawa H, Abe M
Materials Science Forum, 483, 801, 2005
9 Investigation of Degradation of Inversion Channel Mobility of SiC MOSFET due to the Increase of Channel Doping
Hatakeyama T, Watanabe T, Senzaki J, Kato M, Fukuda K, Shinohe T, Arai K
Materials Science Forum, 483, 829, 2005
10 Characteristics of 4H-SiC MOS interface annealed in N2O
Fujihira K, Tarui Y, Imaizumi M, Ohtsuka K, Takami T, Shiramizu T, Kawase K, Tanimura J, Ozeki T
Solid-State Electronics, 49(6), 896, 2005