검색결과 : 17건
| No. | Article |
|---|---|
| 1 |
Comparison of Cl-2/He, Cl-2/Ar, and Cl-2/Xe plasma chemistries for dry etching of NiFe and NiFeCo Jung KB, Cho H, Hahn YB, Hays DC, Lambers ES, Park YD, Feng T, Childress JR, Pearton SJ Journal of the Electrochemical Society, 146(4), 1465, 1999 |
| 2 |
Parametric study of NiFe and NiFeCo high density plasma etching using CO/NH3 Jung KB, Hong J, Cho H, Onishi S, Johnson D, Park YD, Childress JR, Pearton SJ Journal of the Electrochemical Society, 146(6), 2163, 1999 |
| 3 |
Patterning of NiFe and NiFeCo in CO/NH3 high density plasmas Jung KB, Hong J, Cho H, Onishi S, Johnson D, Park YD, Childress JR, Pearton SJ Journal of Vacuum Science & Technology A, 17(2), 535, 1999 |
| 4 |
Comparison of Cl-2 and F-2 based chemistries for the inductively coupled plasma etching of NiMnSb thin films Hong J, Caballero JA, Lambers ES, Childress JR, Pearton SJ Journal of Vacuum Science & Technology A, 17(4), 1326, 1999 |
| 5 |
Effect of inert gas additive on Cl-2-based inductively coupled plasma etching of NiFe and NiFeCo Jung KB, Cho H, Hahn YB, Hays DC, Lambers ES, Park YD, Feng T, Childress JR, Pearton SJ Journal of Vacuum Science & Technology A, 17(4), 2223, 1999 |
| 6 |
Iodine- and bromine-based dry etching of LaCaMnO3 Wang JJ, Cho H, Childress JR, Pearton SJ, Sharifi F, Dahmen KH, Gillman ES Plasma Chemistry and Plasma Processing, 19(2), 229, 1999 |
| 7 |
Dry etch patterning of LaCaMnO3 and SmCo thin films Wang JJ, Childress JR, Pearton SJ, Sharifi F, Dahmen KH, Gillman ES, Cadieu FJ, Rani R, Qian XR, Chen L Journal of the Electrochemical Society, 145(7), 2512, 1998 |
| 8 |
Copper dry etching with Cl-2/Ar plasma chemistry Lee JW, Park YD, Childress JR, Pearton SJ, Sharifi F, Ren F Journal of the Electrochemical Society, 145(7), 2585, 1998 |
| 9 |
Cl-2-based inductively coupled plasma etching of NiFe and related materials Jung KB, Lambers ES, Childress JR, Pearton SJ, Jenson M, Hurst AT Journal of the Electrochemical Society, 145(11), 4025, 1998 |
| 10 |
Development of electron cyclotron resonance and inductively coupled plasma high density plasma etching for patterning of NiFe and NiFeCo Jung KB, Lambers ES, Childress JR, Pearton SJ, Jenson M, Hurst AT Journal of Vacuum Science & Technology A, 16(3), 1697, 1998 |