검색결과 : 1건
| No. | Article |
|---|---|
| 1 |
The interfacial reaction between ITO and silicon nitride deposited by PECVD in fringe field switching device Son KS, Choi DL, Lee HN, Lee WG Current Applied Physics, 2(3), 229, 2002 |
| No. | Article |
|---|---|
| 1 |
The interfacial reaction between ITO and silicon nitride deposited by PECVD in fringe field switching device Son KS, Choi DL, Lee HN, Lee WG Current Applied Physics, 2(3), 229, 2002 |